The semiconducting thin film technology has developed rapidly in recent years

Editor's note: On May 22, researchers at North Carolina State University developed a new technology for manufacturing high-quality atomic-weight semiconductor thin films (thin film thickness is only a single atom diameter). This is a major breakthrough in semi-conducting thin film technology by another national scientific researcher after Germany and Japan. From organic thin-film semiconductors, organic semiconductor single-crystal thin films to now atomic-weight semiconductor thin films, the development of semiconductor technology in the future may enter the atomic-weight era.

New organic molecules shape organic thin-film semiconductors

According to the interpretation of relevant data, the thin film material refers to a thin metal or organic layer with a thickness ranging from a single atom to a few millimeters. Thin film technology is mainly used in electronic semiconductor functional devices and optical coating.

On March 16, 2010, German researchers announced that they have developed a new organic molecule that can be used to manufacture high-performance organic thin-film semiconductors. According to researchers from the University of Wurzburg, Germany, they cooperated with researchers from BASF in Germany to successfully synthesize a new organic molecule. Tests conducted by Stanford University in the United States have proved that this organic molecule has strong semiconductor performance and oxidation resistance characteristics, and is suitable for making electronic circuits under vacuum conditions.

German experts pointed out that the most striking aspect of the new material is that it can still work normally after being exposed to the air for 20 months, and ordinary organic semiconductor materials will usually be affected by oxidation damage in a relatively short period of time. Organic thin-film semiconductors are expected to be widely used in the computer and other information industries in the future, such as making flexible "flexible displays."

Japan developed organic semiconductor single crystal thin film

On July 14, 2011, Japan developed a new technology for making organic semiconductor single crystal thin films. This new technology is jointly developed by researchers from Japan ’s Industrial Technology Research Institute and other institutions to enable thin film field effect transistors (TFTs) required by large-area electronic devices such as flat panel displays to have a performance that is 100 times higher than products made by traditional methods the above.

In this study, the researchers used an ink containing organic semiconductor C8-BTBT and an ink that promoted crystallization of organic semiconductors, and sprayed successively to solve the problem of uneven semiconductor coatings. The organic semiconductor single crystal thin film made with new technology not only has a very uniform semiconductor coating, but also has a thickness of only 30 nanometers.

Defect-free semiconductor nanocrystal film

In 2012, researchers at the Massachusetts Institute of Technology used electron beam lithography and stripping processes to develop defect-free semiconductor nanocrystal thin films. The conductivity of the defect-free film made this time is about 180 times that of the cracked film made by traditional methods.

Scientists claim that this manufacturing method can also be applied to the silicon surface to make a 30-nanometer wide film. The trick is to make the thin film structure uniform and tightly adhere to the silica base. This can be achieved by covering the surface with a thin polymer layer before the nanocrystalline layer is deposited on the silicon surface. It is speculated that the tiny organic molecules on the surface of the nanocrystals can also help them combine with the polymer layer.

The researchers said that this nanocrystalline film can be used in a variety of applications. Because they can not only emit light, but also absorb multiple colors of light. This helps to form light-emitting pixels on the screen of high-resolution displays, or to make new types of high-efficiency, broad-spectrum solar cells. At the same time, this material can also be used to develop high-sensitivity detectors for a small number of specific biomolecules, such as toxin screening systems or medical testing equipment. In addition, the success of this technology has also opened new research on how electrons move within nanocrystalline films.

High quality atomic weight semiconductor film

Researchers from North Carolina State University said on May 22 that they have developed a new technology for manufacturing high-quality atomic-scale semiconductor thin films (thin film thickness is only a single atom diameter), which can reduce the scale of existing semiconductor technologies to atomic-level , Including lasers, light-emitting diodes and computer chips.

The low-cost semiconductor material-molybdenum sulfide is the material of this study. The material can be grown in a single atom layer to form a single layer film, and the film will not lose the original material characteristics. In the new technology, the researchers placed sulfur powder and molybdenum chloride powder in the furnace and gradually raised the temperature to 850 degrees Celsius. At this time, the two powders evaporated (vaporized) and chemically reacted to form molybdenum sulfide. Continue to maintain high temperature, molybdenum sulfide can be deposited on the substrate, forming a thin film of molybdenum sulfide.

According to the researchers, the key to the success of this technology is to find a new growth mechanism for molybdenum sulfide, that is, self-limiting growth, to accurately control the thickness of the molybdenum sulfide layer by controlling the partial pressure and vapor pressure in the high-temperature furnace. Researchers are currently trying to find other ways to make similar thin films that consist of different materials for each atomic layer. At the same time, they are also using new technologies to make field-effect transistors and light-emitting diodes.

With the development of technology, the application of thin films is becoming more and more extensive, but some insiders have suggested that in the next 8 years, the development of semiconductor thin films may reach saturation, and then thin-film photovoltaics or future development trends will also be a highlight of clean energy. In any case, the development and breakthrough of new technologies are constantly rewriting the history of the development and construction of human society.

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